Reading time ( words)
The European Institute of Printed Circuits (EIPC) will be holding its 2015 Summer Conference in Berlin, Germany. Scheduled for June 18-19, the event will include a visit to the Fraunhofer Institute.
The conference will have an iconic selection of speakers, including EIPC Chairman Alun Morgan, who will present a market outlook, followed by such luminaries as Dr. Ivan Ndip, Lars Böttcher and Dr. Olaf Wittler, all from Fraunhofer IZM; Walter Huck from IEC; Martyn Gaudion of Polar Instruments; and speakers from AT&S, Thales, Cimulec, Atotech, Taiyo, Camtek, First EIE, Du Pont and Cambridge Nanotherm, among many others.
The conference registration form can be downloaded here, while the the detailed conference program can be found here.
Barry Matties, I-Connect007
June marks the start of summer, and with that, the EIPC’s annual summer conference. Highlighted by its thought-provoking presentations, social outings and factory tours, the conference continues to be valuable and productive for attendees. This year should prove no different, with EIPC set to celebrate its 50th anniversary. I spoke with EIPC Executive Director Kirsten Smit-Westenberg about what can be expected from the upcoming conference in Düsseldorf, Germany.
Pete Starkey and Patty Goldman, I-Connect007
The EIPC booth was a busy place during productronica, with several members and other organizations headquartered there, resulting in a constant stream of people stopping by to visit, get information and study the upcoming conference agendas. Overseeing the big, and even the little things, was Executive Director Kirsten Smit-Westenberg, who made sure important questions got answered, people stayed hydrated, and EIPC’s magnetic pins found homes on shirt collars.
Patty Goldman, I-Connect007
It seems very appropriate, coming on the heels of IPC APEX EXPO 2016, that the focus of our April issue is process engineering. I believe process engineers (and process engineer types) are the worker bees of IPC (and obviously of the companies they work for).